Title :
75 GHz Bipolar Production Technology for the 21st Century
Author :
Klein, Wolfgang ; Klepser, Bemd-Ulrich H.
Author_Institution :
Infineon Technologies, Munich, Germany
Keywords :
CMOS process; CMOS technology; Cutoff frequency; Epitaxial growth; Germanium silicon alloys; Integrated circuit technology; Noise figure; Parasitic capacitance; Production; Silicon germanium;
Conference_Titel :
Solid-State Device Research Conference, 1999. Proceeding of the 29th European
Conference_Location :
Leuven, Belgium
Print_ISBN :
2-86332-245-1