Title : 
75 GHz Bipolar Production Technology for the 21st Century
         
        
            Author : 
Klein, Wolfgang ; Klepser, Bemd-Ulrich H.
         
        
            Author_Institution : 
Infineon Technologies, Munich, Germany
         
        
        
        
        
        
        
            Keywords : 
CMOS process; CMOS technology; Cutoff frequency; Epitaxial growth; Germanium silicon alloys; Integrated circuit technology; Noise figure; Parasitic capacitance; Production; Silicon germanium;
         
        
        
        
            Conference_Titel : 
Solid-State Device Research Conference, 1999. Proceeding of the 29th European
         
        
            Conference_Location : 
Leuven, Belgium
         
        
            Print_ISBN : 
2-86332-245-1