DocumentCode
440238
Title
Analysis of Process Influence on HSQ Dielectric and Impact on CMOS Circuit Performance
Author
Lair, C. ; Froment, B. ; Haond, M.
Author_Institution
CNET / STMicroelectronics, Crolles, France
Volume
1
fYear
1999
fDate
13-15 Sept. 1999
Firstpage
264
Lastpage
267
Keywords
CMOS process; CMOS technology; Capacitance measurement; Capacitors; Circuit optimization; Dielectric constant; Dielectric materials; Measurement standards; Performance analysis; Space technology;
fLanguage
English
Publisher
ieee
Conference_Titel
Solid-State Device Research Conference, 1999. Proceeding of the 29th European
Conference_Location
Leuven, Belgium
Print_ISBN
2-86332-245-1
Type
conf
Filename
1505490
Link To Document