Title :
Analysis of Process Influence on HSQ Dielectric and Impact on CMOS Circuit Performance
Author :
Lair, C. ; Froment, B. ; Haond, M.
Author_Institution :
CNET / STMicroelectronics, Crolles, France
Keywords :
CMOS process; CMOS technology; Capacitance measurement; Capacitors; Circuit optimization; Dielectric constant; Dielectric materials; Measurement standards; Performance analysis; Space technology;
Conference_Titel :
Solid-State Device Research Conference, 1999. Proceeding of the 29th European
Conference_Location :
Leuven, Belgium
Print_ISBN :
2-86332-245-1
