Title :
High rate CVD-diamond etching for high temperature pressure sensor applications
Author :
Otterbach, R. ; Hilleringmann, U.
Author_Institution :
University of Dortmund, Germany
Keywords :
Anisotropic magnetoresistance; Biomembranes; Chemical sensors; Etching; Image sensors; Joining processes; Mechanical sensors; Piezoresistance; Silicon; Temperature sensors;
Conference_Titel :
Solid-State Device Research Conference, 1999. Proceeding of the 29th European
Conference_Location :
Leuven, Belgium
Print_ISBN :
2-86332-245-1
