440260

The effect of elevated temperature on the reliability of very thin oxide films

Kaczer, B. ; Degraeve, R. ; Pangon, N. ; Nigam, T. ; Groeseneken, G.

IMEC, Leuven, Belgium

1

1999

13-15 Sept. 1999

356

359

Acceleration; Electric breakdown; Integrated circuit reliability; Integrated circuit technology; Logic circuits; Logic devices; Silicon carbide; Stress measurement; Temperature distribution; Testing;

English

ieee

Solid-State Device Research Conference, 1999. Proceeding of the 29th European

Leuven, Belgium

2-86332-245-1

conf

1505513