DocumentCode :
440266
Title :
High performance raised Gate/Source/Drain transistors for sub-0.15 um CMOS technologies
Author :
Meer, H. Van ; Kubicek, S. ; Lyu, Jianguo ; Caymax, M. ; Loo, R. ; Meyer, K. De
Author_Institution :
IMEC, Leuven, Belgium
Volume :
1
fYear :
1999
fDate :
13-15 Sept. 1999
Firstpage :
388
Lastpage :
391
Keywords :
Boron; CMOS technology; Fabrication; Implants; Isolation technology; Lithography; MOSFETs; Rapid thermal processing; Silicon; Space technology;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Solid-State Device Research Conference, 1999. Proceeding of the 29th European
Conference_Location :
Leuven, Belgium
Print_ISBN :
2-86332-245-1
Type :
conf
Filename :
1505521
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=440266