DocumentCode :
440270
Title :
Gate Stack Optimisation for Advanced CMOS Process
Author :
Kubicek, S. ; Vandenberghe, G. ; Schaekers, M. ; Kold´yaev, V. ; Jansen, P. ; Badenes, G. ; Deferm, L. ; De Meyer, K. ; Kerr, D. ; Naem, A.
Author_Institution :
IMEC, Leuven, Belgium
Volume :
1
fYear :
1999
fDate :
13-15 Sept. 1999
Firstpage :
412
Lastpage :
415
Keywords :
CMOS process; CMOS technology; Capacitors; Chemical technology; Dielectrics; Isolation technology; Lithography; MOS devices; MOSFETs; Temperature;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Solid-State Device Research Conference, 1999. Proceeding of the 29th European
Conference_Location :
Leuven, Belgium
Print_ISBN :
2-86332-245-1
Type :
conf
Filename :
1505527
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=440270