DocumentCode :
440273
Title :
The Effect of Oxide Patterned Layers on the Rapid Thermal Oxidation of Polycrystalline Silicon
Author :
Sullivan, B. J O ; Hurley, P.K. ; Mathewson, A. ; Beanland, R. ; Rodrigues, R. ; Kay, P.
Author_Institution :
National Microelectronics Research Centre, Cork, Ireland
Volume :
1
fYear :
1999
fDate :
13-15 Sept. 1999
Firstpage :
424
Lastpage :
427
Keywords :
Annealing; Capacitors; Contacts; Dielectrics; Materials science and technology; Microelectronics; Oxidation; Semiconductor films; Silicon compounds; Temperature measurement;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Solid-State Device Research Conference, 1999. Proceeding of the 29th European
Conference_Location :
Leuven, Belgium
Print_ISBN :
2-86332-245-1
Type :
conf
Filename :
1505530
Link To Document :
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