440274

Structure and Memory Effects of Low Energy Ge-Implanted Thin SiO2 Films

Kapetanakis, E. ; Normand, P. ; Tsoukalas, D. ; Beltsios, K. ; Travlos, T. ; Gautier, J. ; Palun, L. ; Jourdan, F.

National Centre for Scientific Research "Demokritos", Aghia Paraskevi, Greece

1

1999

13-15 Sept. 1999

432

435

Amorphous materials; Annealing; Capacitance-voltage characteristics; Capacitors; Electron traps; Glass; Material storage; Temperature; Transmission electron microscopy; Voltage;

English

ieee

Solid-State Device Research Conference, 1999. Proceeding of the 29th European

Leuven, Belgium

2-86332-245-1

conf

1505532