• DocumentCode
    440288
  • Title

    Gate Workfunction Engineering for Deep Submicron CMOS

  • Author

    Dachs, C.J.J. ; Ponomarev, Y.V. ; Stolk, P.A. ; Montree, A.H.

  • Author_Institution
    Philips Research Laboratories, Eindhoven, The Netherlands
  • Volume
    1
  • fYear
    1999
  • fDate
    13-15 Sept. 1999
  • Firstpage
    500
  • Lastpage
    503
  • Keywords
    Boron; CMOS technology; Design optimization; Doping profiles; Implants; Inorganic materials; MOS devices; MOSFETs; Power engineering and energy; Semiconductor materials;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Solid-State Device Research Conference, 1999. Proceeding of the 29th European
  • Conference_Location
    Leuven, Belgium
  • Print_ISBN
    2-86332-245-1
  • Type

    conf

  • Filename
    1505549
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=440288