440288

Gate Workfunction Engineering for Deep Submicron CMOS

Dachs, C.J.J. ; Ponomarev, Y.V. ; Stolk, P.A. ; Montree, A.H.

Philips Research Laboratories, Eindhoven, The Netherlands

1

1999

13-15 Sept. 1999

500

503

Boron; CMOS technology; Design optimization; Doping profiles; Implants; Inorganic materials; MOS devices; MOSFETs; Power engineering and energy; Semiconductor materials;

English

ieee

Solid-State Device Research Conference, 1999. Proceeding of the 29th European

Leuven, Belgium

2-86332-245-1

conf

1505549