Title :
Sub-0.1um MOSFETs with Sb source/drain extensions
Author :
To, Kun H. ; Woo, Jason C S
Author_Institution :
University of California, Los Angeles, CA, USA
Keywords :
Boron; Dielectric substrates; Doping; Furnaces; Implants; MOS devices; MOSFETs; Rapid thermal annealing; Solids; Thermal resistance;
Conference_Titel :
Solid-State Device Research Conference, 1999. Proceeding of the 29th European
Conference_Location :
Leuven, Belgium
Print_ISBN :
2-86332-245-1
