Sub-0.1um MOSFETs with Sb source/drain extensions

Author

To, Kun H. ; Woo, Jason C S

Author_Institution

University of California, Los Angeles, CA, USA

Volume

fYear

1999

fDate

13-15 Sept. 1999

Firstpage

576

Lastpage

579

Keywords

Boron; Dielectric substrates; Doping; Furnaces; Implants; MOS devices; MOSFETs; Rapid thermal annealing; Solids; Thermal resistance;

fLanguage

English

Publisher

ieee

Conference_Titel

Solid-State Device Research Conference, 1999. Proceeding of the 29th European

Conference_Location

Leuven, Belgium

Print_ISBN

2-86332-245-1

Type

Filename

1505568

Link To Document