مرکز منطقه ای اطلاع رساني علوم و فناوري - Optimisation of Critical Parameters in a Low Cost, High Performance Deep Submicron CMOS Technology

DocumentCode :

440305

Title :

Optimisation of Critical Parameters in a Low Cost, High Performance Deep Submicron CMOS Technology

Author :

Badenes, G. ; Perelló, C. ; Rupp, A. ; Vandamme, E. ; Augendre, E. ; Pochet, S. ; Deferm, L.

Author_Institution :

IMEC, Leuven, Belgium

Volume :

fYear :

1999

fDate :

13-15 Sept. 1999

Firstpage :

628

Lastpage :

631

Keywords :

Annealing; CMOS technology; Continuous improvement; Cost function; Doping profiles; Frequency; Implants; MOS devices; Scalability; Silicon;

fLanguage :

English

Publisher :

ieee

Conference_Titel :

Solid-State Device Research Conference, 1999. Proceeding of the 29th European

Conference_Location :

Leuven, Belgium

Print_ISBN :

2-86332-245-1

Type :

conf

Filename :

1505581

Link To Document :