• DocumentCode
    440307
  • Title

    A High Performance 0.18 um Elevated Source/Drain Technology with Improved Manufacturability

  • Author

    Augendre, E. ; Rooyackers, R. ; Vandamme, E. ; Perelló, C. ; Dievel, M. Van ; Pochet, S. ; Badenes, G.

  • Author_Institution
    IMEC, Leuven, Belgium
  • Volume
    1
  • fYear
    1999
  • fDate
    13-15 Sept. 1999
  • Firstpage
    636
  • Lastpage
    639
  • Keywords
    Electrodes; Epitaxial growth; Fabrication; Frequency measurement; MOS devices; MOSFETs; Manufacturing processes; Silicidation; Silicides; Silicon;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Solid-State Device Research Conference, 1999. Proceeding of the 29th European
  • Conference_Location
    Leuven, Belgium
  • Print_ISBN
    2-86332-245-1
  • Type

    conf

  • Filename
    1505583
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=440307