Title :
Investigation of the Suppression of the Narrow Channel Effect in Deep Sub-Micron EXTIGATE Transistors
Author :
Burenkov, A. ; Tietzel, K. ; Lorenz, J. ; Ryssel, H. ; Schwalke, U.
Author_Institution :
Fraunhofer-Institut f¨ur Integrierte Schaltungen, Erlangen, Germany
Keywords :
CMOS process; CMOS technology; Doping; Electrodes; Isolation technology; MOSFETs; Oxidation; Shape; Silicon; Transistors;
Conference_Titel :
Solid-State Device Research Conference, 1999. Proceeding of the 29th European
Conference_Location :
Leuven, Belgium
Print_ISBN :
2-86332-245-1
