Title :
Time-resolved X-ray absorption fine structure measurement of laser-melted Si with femtosecond laser-produced-plasma X-ray source
Author :
Oguri, Katsuya ; Okano, Yasuaki ; Nishikawa, Tadashi ; Nakano, Hidetoshi
Author_Institution :
NTT Basic Res. Labs., NTT Corp., Atsugi, Japan
Abstract :
We describe the picosecond time-resolved measurement of the X-ray absorption fine structure in laser-melted Si by using a femtosecond laser-produced-plasma soft X-ray source and report that the Si-Si atomic distance broadened due to the melting.
Keywords :
X-ray absorption; fine structure; high-speed optical techniques; plasma X-ray sources; plasma production by laser; Si; Si-Si atomic distance; X-ray absorption; femtosecond laser-produced-plasma; fine structure; laser-melted Si; picosecond time-resolved measurement; soft X-ray source; Atom lasers; Atomic measurements; Electromagnetic wave absorption; Optical pulses; Pulse measurements; Surface emitting lasers; Ultrafast electronics; Ultrafast optics; X-ray diffraction; X-ray lasers;
Conference_Titel :
Quantum Electronics and Laser Science Conference, 2005. QELS '05
Print_ISBN :
1-55752-796-2
DOI :
10.1109/QELS.2005.1548926
