Title :
Defining of requirements to substrate drive for magnetron thin film deposition plants
Author :
Nechaev, Mikhail A.
Author_Institution :
Tomsk Polytech. Univ., Russia
fDate :
26 June-3 July 2004
Abstract :
An adequate design of all parts of sputtering plants is necessary for coating uniformity. This paper discussed the correlation between the substrate speed and coating uniformity for requirements estimation of electric drive dynamic behavior. It is shown here that the drive should be having response time about five times less sputtering time.
Keywords :
electric drives; industrial plants; sputter deposition; thin films; coating uniformity; electric drive dynamic behavior; magnetron thin film; sputtering plants; substrate drive; thin film deposition plants; Coatings; Delay; Design engineering; Displays; Equations; Glass; Nuclear electronics; Sputtering; Substrates; Transistors;
Conference_Titel :
Science and Technology, 2004. KORUS 2004. Proceedings. The 8th Russian-Korean International Symposium on
Print_ISBN :
0-7803-8383-4
DOI :
10.1109/KORUS.2004.1555342
