DocumentCode
446563
Title
Laser patterning - innovative technology for mass production of microstructures
Author
Ulieru, Dumitru ; Ciuciumis, Alina
Volume
1
fYear
2005
fDate
3-5 Oct. 2005
Firstpage
245
Abstract
The improvement of pattern resolution for microsystems fabrication is certainly a proven method for increasing of micro and nanostructure density. Our novel laser technology could be applied for thin metal or alloy films on polymer substrates, which could be structured directly with the laser direct patterning process. So is possible to manufacture ultrafine conductive or reflective structures down to 15 μm in an economical and environmentally friendly way. Increasing demand on the accuracy of microsystems and sensors requires microstructures with lines and spaces down of approximately 5-100 μm.
Keywords
laser ablation; mass production; microsensors; nanopatterning; nanostructured materials; thin films; laser patterning; laser technology; mass production; microsystems fabrication; polymer substrates; reflective structure; sensors; thin film; ultrafine conductive structure; Chemical lasers; Laser ablation; Laser beam cutting; Laser modes; Mass production; Microstructure; Polymer films; Sensor systems; Space technology; Substrates;
fLanguage
English
Publisher
ieee
Conference_Titel
Semiconductor Conference, 2005. CAS 2005 Proceedings. 2005 International
Print_ISBN
0-7803-9214-0
Type
conf
DOI
10.1109/SMICND.2005.1558759
Filename
1558759
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