DocumentCode
44768
Title
Arbitrary Coupling Ratio Multimode Interference Couplers in Silicon-on-Insulator
Author
Domenech, Jose David ; Fandino, Javier S. ; Gargallo, B. ; Munoz, Pascual
Author_Institution
VLC Photonics S.L., Valencia, Spain
Volume
32
Issue
14
fYear
2014
fDate
July15, 7 2014
Firstpage
2536
Lastpage
2543
Abstract
In this paper, we present the design, manufacturing, characterization, and analysis of the coupling ratio spectral response for multimode interference couplers in silicon-on-insulator (SOI) technology. The couplers were designed using a Si rib waveguide with SiO2 cladding, on a regular 220 nm film and 2μm buried oxide SOI wafer. A set of eight different designs, three canonical and five using a widened/narrowed coupler body, have been subject of study, with coupling ratios 50:50, 85:15, and 72:28 for the former, and 95:05, 85:15, 75:25, 65:35, and 55:45 for the latter. Two wafers of devices were fabricated, using two different etch depths for the rib waveguides. A set of six dies, three per wafer, whose line metrology matched the design, were retained for characterization. The coupling ratios obtained in the experimental results match, with little deviations, the design targets for a wavelength range between 1525 and 1575 nm, as inferred from spectral measurements and statistical analyses. Excess loss for all the devices is conservatively estimated to be approximately 0.6 dB in average. All the design parameters, body width and length, input/output positions and widths, and tapers dimensions are disclosed for reference.
Keywords
elemental semiconductors; etching; integrated optoelectronics; light interference; optical couplers; optical design techniques; optical fabrication; optical films; optical losses; optical waveguides; rib waveguides; silicon; silicon compounds; silicon-on-insulator; statistical analysis; SOI technology; Si-SiO2; arbitrary coupling ratio multimode interference couplers; body length; body width; buried oxide SOI wafer; cladding; coupling ratio spectral response; design parameters; etch depth; input-output position; line metrology; rib waveguide; silicon-on-insulator technology; size 2 mum; size 220 nm; spectral measurements; statistical analysis; taper dimension; wavelength 1525 nm to 1575 nm; widened-narrowed coupler body; Couplers; Couplings; Gratings; Interference; Loss measurement; Optical waveguides; Optimization; Coupling ratio; multimode interference coupler; performance statistics; silicon-on-Insulator; variation analysis;
fLanguage
English
Journal_Title
Lightwave Technology, Journal of
Publisher
ieee
ISSN
0733-8724
Type
jour
DOI
10.1109/JLT.2014.2329994
Filename
6828735
Link To Document