DocumentCode
448192
Title
Buried linear extrinsic defects in colloidal photonic crystals
Author
Vekris, Evangellos ; Kitaev, Vladimir ; Von Freymann, Georg ; Ozin, Geoffrey A. ; Aitchison, J.Stewart ; Perovic, Doug
Author_Institution
Dept. of Chem., Toronto Univ., Ont., Canada
Volume
2
fYear
2005
fDate
22-27 May 2005
Firstpage
1171
Abstract
Photolithography combined with colloidal self-assembly enables linear defects to be embedded inside an opal film. Such defects can serve as templates for waveguides, and will allow colloidal PBG materials to be evaluated for integrated optics.
Keywords
colloidal crystals; crystal defects; integrated optics; photolithography; photonic band gap; photonic crystals; self-assembly; silicon compounds; SiO2; buried linear extrinsic defects; colloidal photonic crystals; colloidal self-assembly; integrated optics; opal film; photolithography; Colloidal crystals; Crystalline materials; Integrated optics; Optical device fabrication; Optical films; Optical materials; Optical waveguides; Photonic band gap; Photonic crystals; Silicon compounds;
fLanguage
English
Publisher
ieee
Conference_Titel
Lasers and Electro-Optics, 2005. (CLEO). Conference on
Print_ISBN
1-55752-795-4
Type
conf
DOI
10.1109/CLEO.2005.202061
Filename
1573127
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