• DocumentCode
    4495
  • Title

    Surface-Potential-Based Compact Modeling of Gate Current in AlGaN/GaN HEMTs

  • Author

    Ghosh, Sudip ; Dasgupta, Avirup ; Khandelwal, Sourabh ; Agnihotri, Shantanu ; Chauhan, Yogesh Singh

  • Author_Institution
    Dept. of Electr. Eng., IIT Kanpur, Kanpur, India
  • Volume
    62
  • Issue
    2
  • fYear
    2015
  • fDate
    Feb. 2015
  • Firstpage
    443
  • Lastpage
    448
  • Abstract
    In this paper, the gate current in AlGaN/GaN high-electron mobility transistors is modeled analytically in a surface potential-based compact model. Thermionic emission and Poole-Frenkel emission are two dominant mechanisms for the gate current in the forward and reverse-bias regions, respectively. In addition, a trap-assisted tunneling component, which is important at low reverse bias, is also added. The developed gate current model, implemented in Verilog-A is in excellent agreement with experimental data and passes the important Gummel symmetry test.
  • Keywords
    III-V semiconductors; Poole-Frenkel effect; aluminium compounds; gallium compounds; high electron mobility transistors; semiconductor device models; surface potential; thermionic emission; tunnelling; wide band gap semiconductors; AlGaN-GaN; Gummel symmetry test; HEMTs; Poole-Frenkel emission; Verilog-A; forward-bias regions; gate current model; high-electron mobility transistors; reverse-bias regions; surface-potential-based compact modeling; thermionic emission; trap-assisted tunneling component; Aluminum gallium nitride; Gallium nitride; HEMTs; Leakage currents; Logic gates; MODFETs; Mathematical model; Compact model; GaN high-electron mobility transistor (HEMT); Poole–Frenkel (PF) emission.; Poole???Frenkel (PF) emission; gate leakage current;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/TED.2014.2360420
  • Filename
    6930793