DocumentCode :
450617
Title :
Technology Tracking of Non Manhattan VLSI Layout
Author :
Waterkamp, Johannes ; Wicke, Ralner ; Brück, Rainer ; Reinhardt, Michael ; Schrammeck, G.
Author_Institution :
Universitat Dortmund, Lehrstuhl Informatik 1, Dortmund, West Germany
fYear :
1989
fDate :
25-29 June 1989
Firstpage :
296
Lastpage :
301
Abstract :
Improvements in IC technologies make existing layout libraries obsolete. In order to reuse these layouts, adaptation to the requirements of new technologies have to take place. In this paper a system is presented that automatizes this task using a locally two dimensional compaction algorithm. The system is able to handle arbitrary geometries and arbitrary technologies (including bipolar and mixed ones).
Keywords :
Algorithm design and analysis; CMOS technology; Compaction; Fabrication; Geometry; Integrated circuit layout; Libraries; Microelectronics; Permission; Very large scale integration;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Design Automation, 1989. 26th Conference on
ISSN :
0738-100X
Print_ISBN :
0-89791-310-8
Type :
conf
DOI :
10.1109/DAC.1989.203412
Filename :
1586396
Link To Document :
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