DocumentCode :
453165
Title :
Skin and proximity effects of curved microstrip interconnects
Author :
Hua, Qi ; Mao, Junfa ; Yin, Wen-Yan
Author_Institution :
Sch. of Electron. Inf. & Electr. Eng., Shanghai Jiao Tong Univ., China
Volume :
2
fYear :
2005
fDate :
4-7 Dec. 2005
Abstract :
An accurate procedure was proposed to capture the skin and proximity effect of microstrip interconnects on curved surfaces using an extended volume filament model. These conformal geometries can incorporate some special applications where cylindrical or even elliptic substrate must be used. Parasitic studies were performed to show the hybrid effects of all geometrical and physical parameters on the frequency-dependent distributed series resistance and inductance of these interconnects, which can be further used to predict their responses in the presence of high-power or ultra-wideband electromagnetic pulses.
Keywords :
interconnections; microstrip lines; skin effect; waveguide theory; conformal geometries; curved surface interconnects; distributed series inductance; distributed series resistance; extended volume filament model; microstrip interconnects; proximity effect; skin effect; ultra wideband electromagnetic pulses; EMP radiation effects; Electromagnetic induction; Frequency; Geometry; Inductance; Microstrip; Proximity effect; Skin; Surface resistance; Ultra wideband technology;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microwave Conference Proceedings, 2005. APMC 2005. Asia-Pacific Conference Proceedings
Print_ISBN :
0-7803-9433-X
Type :
conf
DOI :
10.1109/APMC.2005.1606518
Filename :
1606518
Link To Document :
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