DocumentCode
453185
Title
Comparative Studies on (No) Patterned Ground Shield (PGS) RF-CMOS Transformers at Different Temperatures
Author
Shi, Jing-Lin ; Yin, Wen-Yan ; Mao, Junfa ; Li, Le-Wei
Author_Institution
Institute of Microelectronics, Science Park II, Singapore 117685, E-mail: jinglin@ime.a-star.edu.sg
Volume
3
fYear
2005
fDate
4-7 Dec. 2005
Firstpage
1
Lastpage
4
Abstract
Extensively comparative studies are carried out on the performance of on-chip CMOS transformers in the presence and absence of patterned ground shields (PGS) at temperatures of 253 K, 298 K, 333 K, and 373 K. These transformers were fabricated using 0.18 micron CMOS processes and designed to be interleaved and center-tapped interleaved geometries, respectively, but with the same inner dimension, metal track width, track spacing and substrate properties. Based on the two-port S-parameters measured at different temperatures, all performance indicators, such as maximum available gain Gmax, Q-factor of the primary or secondary coil, power loss, and minimum noise figure of these transformers are extracted and compared with each other.
Keywords
CMOS process; Gain measurement; Geometry; Land surface temperature; Loss measurement; Power measurement; Process design; Scattering parameters; Temperature measurement; Transformers;
fLanguage
English
Publisher
ieee
Conference_Titel
Microwave Conference Proceedings, 2005. APMC 2005. Asia-Pacific Conference Proceedings
Print_ISBN
0-7803-9433-X
Type
conf
DOI
10.1109/APMC.2005.1606551
Filename
1606551
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