DocumentCode
453495
Title
Coplanar ferroelectric phase shifter on silicon substrate with TiO2 buffer layer
Author
Kim, Ki-Byoung ; Yun, Tae-Soon ; Kim, Hyun-Suk ; Kim, Il-Doo ; Kim, Ho-Gi ; Lee, Jong-Chul
Author_Institution
RFIC Center, Kwangwoon Univ., Seoul, South Korea
Volume
1
fYear
2005
fDate
4-6 Oct. 2005
Abstract
In this paper, a BST coplanar phase shifter with differential phase shift of 98° at 50 V and FoM of 46.7°/dB has been realized. The potential feasibility of integrating BST films into Si substrate as microwave phase shifter and/or coplanar waveguide tunable devices with TiO2 thin film buffer layer has been successfully demonstrated. TiO2 as buffer layer has been successfully grown onto Si substrate by ALD (atomic layer deposition).
Keywords
atomic layer deposition; buffer layers; coplanar waveguides; microwave phase shifters; silicon; titanium compounds; 50 V; BST coplanar phase shifter; TiO2; atomic layer deposition; buffer layer; coplanar ferroelectric phase shifter; coplanar waveguide tunable device; microwave phase shifter; Binary search trees; Buffer layers; Coplanar waveguides; Ferroelectric films; Ferroelectric materials; Microwave devices; Phase shifters; Semiconductor films; Silicon; Substrates;
fLanguage
English
Publisher
ieee
Conference_Titel
Microwave Conference, 2005 European
Print_ISBN
2-9600551-2-8
Type
conf
DOI
10.1109/EUMC.2005.1608940
Filename
1608940
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