Surface Layer Analysis of Si Sphere by XRF and XPS

Author

Lulu Zhang ; Azuma, Yasushi ; Kurokawa, Akira ; Kuramoto, Naoki ; Fujii, Kenichi

Author_Institution

Nat. Metrol. Inst. of Japan, Nat. Inst. of Adv. Ind. Sci. & Technol., Tsukuba, Japan

Volume

64

Issue

6

fYear

2015

fDate

Jun-15

Firstpage

1509

Lastpage

1513

Abstract

To reduce the uncertainty of the Avogadro constant for the new definition of the kilogram, the surface analysis of the Si sphere produced for the accurate determination of the Avogadro constant is indispensable. In this paper, we conducted the surface quantitative analyses to find out the metallic contaminations on a 1-kg natural Si sphere by X-ray fluorescence analysis. The X-ray photoelectron spectroscopy investigations were also carried out to estimate the thickness of the oxide layer and clarify the chemical binding state of the carbonaceous contamination layer on the surface of a dummy Si sphere.

Keywords

X-ray fluorescence analysis; X-ray photoelectron spectra; elemental semiconductors; silicon; surface contamination; surface topography measurement; thickness measurement; Avogadro constant; Si; X-ray fluorescence analysis; X-ray photoelectron spectroscopy; XPS; XRF; carbonaceous contamination layer; chemical binding state; mass 1 kg; metallic contamination; sphere; surface layer analysis; surface quantitative analyses; thickness estimation; Cleaning; Metrology; Nickel; Pollution measurement; Silicon; Surface contamination; Chemical analysis; X-ray spectroscopy; X-ray spectroscopy.; silicon; surface contamination; thickness measurement;

fLanguage

English

Journal_Title

Instrumentation and Measurement, IEEE Transactions on

Publisher

ieee

ISSN

0018-9456

Type

jour

DOI

10.1109/TIM.2015.2389352

Filename

7029043