DocumentCode :
45506
Title :
Surface Layer Analysis of Si Sphere by XRF and XPS
Author :
Lulu Zhang ; Azuma, Yasushi ; Kurokawa, Akira ; Kuramoto, Naoki ; Fujii, Kenichi
Author_Institution :
Nat. Metrol. Inst. of Japan, Nat. Inst. of Adv. Ind. Sci. & Technol., Tsukuba, Japan
Volume :
64
Issue :
6
fYear :
2015
fDate :
Jun-15
Firstpage :
1509
Lastpage :
1513
Abstract :
To reduce the uncertainty of the Avogadro constant for the new definition of the kilogram, the surface analysis of the Si sphere produced for the accurate determination of the Avogadro constant is indispensable. In this paper, we conducted the surface quantitative analyses to find out the metallic contaminations on a 1-kg natural Si sphere by X-ray fluorescence analysis. The X-ray photoelectron spectroscopy investigations were also carried out to estimate the thickness of the oxide layer and clarify the chemical binding state of the carbonaceous contamination layer on the surface of a dummy Si sphere.
Keywords :
X-ray fluorescence analysis; X-ray photoelectron spectra; elemental semiconductors; silicon; surface contamination; surface topography measurement; thickness measurement; Avogadro constant; Si; X-ray fluorescence analysis; X-ray photoelectron spectroscopy; XPS; XRF; carbonaceous contamination layer; chemical binding state; mass 1 kg; metallic contamination; sphere; surface layer analysis; surface quantitative analyses; thickness estimation; Cleaning; Metrology; Nickel; Pollution measurement; Silicon; Surface contamination; Chemical analysis; X-ray spectroscopy; X-ray spectroscopy.; silicon; surface contamination; thickness measurement;
fLanguage :
English
Journal_Title :
Instrumentation and Measurement, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9456
Type :
jour
DOI :
10.1109/TIM.2015.2389352
Filename :
7029043
Link To Document :
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