Title :
Rare-Earth-Ion-Doped Channel Waveguide Lasers on Silicon
Author_Institution :
Dept. of Mater. & Nano Phys., KTH-R. Inst. of Technol., Stockholm, Sweden
Abstract :
This paper reviews the recent developments in rare-earth-ion-doped channel waveguide lasers. Optical gain in rare-earth-ion-doped waveguides has been increased by two orders of magnitude to ~1000 dB/cm and waveguide lasers with extremely high slope efficiencies and output powers exceeding the Watt level have been demonstrated. Of particular interest in integrated optics is the recent integration of rare-earth-ion-doped channel waveguide lasers in amorphous materials directly deposited on a silicon substrate. Remarkable performance with respect to slope efficiency, output power, and laser linewidth has been achieved.
Keywords :
integrated optics; rare earth compounds; reviews; silicon; solid lasers; spectral line breadth; waveguide lasers; Si; amorphous materials; integrated optics; laser linewidth; optical gain; rare-earth-ion-doped channel waveguide lasers; silicon substrate; Gain; Laser excitation; Optical waveguides; Polymers; Pump lasers; Waveguide lasers; Amorphous materials; CW lasers; dielectric waveguides; distributed Bragg reflector lasers; distributed feedback lasers; integrated optics; optical amplifiers; planar wave-guides; rare earth compounds; solid lasers;
Journal_Title :
Selected Topics in Quantum Electronics, IEEE Journal of
DOI :
10.1109/JSTQE.2014.2351811