• DocumentCode
    45668
  • Title

    Rare-Earth-Ion-Doped Channel Waveguide Lasers on Silicon

  • Author

    Pollnau, Markus

  • Author_Institution
    Dept. of Mater. & Nano Phys., KTH-R. Inst. of Technol., Stockholm, Sweden
  • Volume
    21
  • Issue
    1
  • fYear
    2015
  • fDate
    Jan.-Feb. 2015
  • Firstpage
    414
  • Lastpage
    425
  • Abstract
    This paper reviews the recent developments in rare-earth-ion-doped channel waveguide lasers. Optical gain in rare-earth-ion-doped waveguides has been increased by two orders of magnitude to ~1000 dB/cm and waveguide lasers with extremely high slope efficiencies and output powers exceeding the Watt level have been demonstrated. Of particular interest in integrated optics is the recent integration of rare-earth-ion-doped channel waveguide lasers in amorphous materials directly deposited on a silicon substrate. Remarkable performance with respect to slope efficiency, output power, and laser linewidth has been achieved.
  • Keywords
    integrated optics; rare earth compounds; reviews; silicon; solid lasers; spectral line breadth; waveguide lasers; Si; amorphous materials; integrated optics; laser linewidth; optical gain; rare-earth-ion-doped channel waveguide lasers; silicon substrate; Gain; Laser excitation; Optical waveguides; Polymers; Pump lasers; Waveguide lasers; Amorphous materials; CW lasers; dielectric waveguides; distributed Bragg reflector lasers; distributed feedback lasers; integrated optics; optical amplifiers; planar wave-guides; rare earth compounds; solid lasers;
  • fLanguage
    English
  • Journal_Title
    Selected Topics in Quantum Electronics, IEEE Journal of
  • Publisher
    ieee
  • ISSN
    1077-260X
  • Type

    jour

  • DOI
    10.1109/JSTQE.2014.2351811
  • Filename
    6883134