DocumentCode :
45935
Title :
Subwavelength grating Bragg grating filters in silicon-on-insulator
Author :
Wang, J. ; Glesk, I. ; Chen, L.R.
Author_Institution :
Dept. of Electr. & Comput. Eng., McGill Univ., Montreal, QC, Canada
Volume :
51
Issue :
9
fYear :
2015
fDate :
4 30 2015
Firstpage :
712
Lastpage :
714
Abstract :
Narrowband filters based on Bragg gratings (BGs) in subwavelength grating (SWG) waveguides in silicon-on-insulator are reported. The SWG BGs are fabricated using electron beam lithography with a single etch. For SWG BGs 1.12 mm in length, the measured 3 dB bandwidths are ~0.5 nm, and they have a peak reflectivity as high as 94.4% in the C-band.
Keywords :
Bragg gratings; electron beam lithography; optical fabrication; optical filters; optical waveguides; silicon-on-insulator; Bragg grating filters; C-band; SWG waveguides; Si; electron beam lithography; narrowband filters; silicon-on-insulator; single etching; size 1.12 nm; subwavelength grating waveguides;
fLanguage :
English
Journal_Title :
Electronics Letters
Publisher :
iet
ISSN :
0013-5194
Type :
jour
DOI :
10.1049/el.2015.0546
Filename :
7095736
Link To Document :
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