Title :
Influence of AlN Thin Film as Thermal Interface Material on Thermal and Optical Properties of High-Power LED
Author :
Subramani, Siva ; Devarajan, Mutharasu
Author_Institution :
Sch. of Phys., Univ. Sains Malaysia, Minden, Malaysia
Abstract :
An AlN thin film was fabricated and used as a thermal interface material (TIM) for a high-power light-emitting diode (LED) application. The AlN thin film was stacked with an Al thin film on Al substrates and used as a heat sink. The thermal behavior of a 3-W green LED mounted on the AlN and AlN/Al stack thin-film-coated substrates was tested using a dual interface method. A low value in junction temperature (TJ) of the LED was observed with an AlN/Al stack used as the interface. The observed total thermal resistance (Rth-tot) was low for the AlN/Al-stack-coated Al substrates compared to the bare and thermal-paste-applied Al substrates. The interface thermal resistance (Rth-b-hs) was influenced by the driving currents and observed a low value with the AlN-based coatings. Improved luminosity was observed from the LED with the AlN/Al stack as the TIM. The observed correlated color temperature (CCT) was low for the AlN/Al stack at all driving currents. No significant change was observed in the color rendering index (CRI) and peak wavelength (λpeak).
Keywords :
III-V semiconductors; aluminium; aluminium compounds; heat sinks; light emitting diodes; semiconductor thin films; semiconductor-metal boundaries; thermal resistance; wide band gap semiconductors; Al; Al substrates; AlN thin film; AlN-Al; color rendering index; correlated color temperature; dual interface method; green LED; heat sink; high-power light-emitting diode application; junction temperature; luminosity; optical properties; peak wavelength; power 3 W; thermal interface material; thermal properties; thermal resistance; Annealing; Current measurement; III-V semiconductor materials; Light emitting diodes; Substrates; Thermal resistance; AlN; LED; optical properties; thermal interface material; thermal properties; thin film stack;
Journal_Title :
Device and Materials Reliability, IEEE Transactions on
DOI :
10.1109/TDMR.2013.2285112