Title :
2D Multiple Beam Interference Lithography
Author :
Apostol, A.D. ; Damian, V. ; Garoi, F. ; Iordache, Luliana ; Logofatu, P.C. ; Nascov, V. ; Sima, A. ; Cristea, B. Dana ; Muller, Raluca
Author_Institution :
Dept. of Lasers, National Inst. for Laser, Plasma & Radiat. Phys., M gurele
Abstract :
Interference or holographic lithography seems to be the most studied lithographic technique today for obtaining large area of symmetric patterns as a result of the interference of two, three, four or more beams of different shape or structures. Simulated and corresponding real fringe patterns are presented
Keywords :
holography; interference; lithography; 2D multiple beam; holographic lithography; interference lithography; real fringe patterns; symmetric patterns; Gratings; Holography; Interference; Laser beams; Laser theory; Lithography; Optical device fabrication; Periodic structures; Plasmas; Resists; holography; lithography;
Conference_Titel :
International Semiconductor Conference, 2006
Conference_Location :
Sinaia
Print_ISBN :
1-4244-0109-7
DOI :
10.1109/SMICND.2006.283955
