Title :
Litholab: a new environment for micro-lithography modeling
Author :
Chen, Ye ; Shi, Zheng ; Zhou, Ke ; Ma, LYule ; Shen, Shanhu ; Yan, Xiaolang
Author_Institution :
Inst. of VLSI Design, Zhejiang Univ., Hangzhou
Abstract :
With minimum feature sizing down, more advanced configurations are used in micro-lithographic systems. It is harder than before to build an accurate lithography model. In this paper, a new micro-lithography modeling environment is introduced, which provides a set of handy tools to easily customize and build models for micro-lithographic system with advanced configurations. The ability and structure of the environment are described in detail. Examples show the efficiency and accuracy of the environment
Keywords :
photolithography; programming environments; semiconductor process modelling; Litholab; microlithography modeling environment; Apertures; Data visualization; Libraries; Lighting; Lithography; Polarization; Power system modeling; Production; Shape; Very large scale integration;
Conference_Titel :
Solid-State and Integrated Circuit Technology, 2006. ICSICT '06. 8th International Conference on
Conference_Location :
Shanghai
Print_ISBN :
1-4244-0160-7
Electronic_ISBN :
1-4244-0161-5
DOI :
10.1109/ICSICT.2006.306234
