DocumentCode :
462471
Title :
A Simulation Study of Silicon Avalanche Photodiodes
Author :
Jung, S. ; Moon, M. ; Kim, H.J. ; Park, H. ; Ryu, S.
Author_Institution :
Dept. of Phys., Kyungpook Nat. Univ., Daegu
Volume :
2
fYear :
2006
fDate :
Oct. 29 2006-Nov. 1 2006
Firstpage :
1064
Lastpage :
1067
Abstract :
In this paper we report simulation results of photon entrance window and AR (antireflection) coating. Also a simulation result of reverse type APD is presented for the detection of visible light from scintillator crystals by using the process simulation tool Athena and device simulation tool Atlas from Silvaco International. The fabrication method used in the process simulation of the device is conventional ion implantation and diffusion method.
Keywords :
antireflection coatings; avalanche photodiodes; elemental semiconductors; scintillation counters; semiconductor device manufacture; semiconductor diodes; Athena; Atlas; Silvaco International; antireflection coating; device simulation tool; ion diffusion method; ion implantation method; photon entrance window; process simulation tool; reverse type APD; scintillator crystals; silicon avalanche photodiodes; visible light detection; Avalanche photodiodes; Coatings; Dark current; Infrared detectors; Manufacturing processes; Medical simulation; Optical reflection; Silicon; X-ray detection; X-ray detectors;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Nuclear Science Symposium Conference Record, 2006. IEEE
Conference_Location :
San Diego, CA
ISSN :
1095-7863
Print_ISBN :
1-4244-0560-2
Electronic_ISBN :
1095-7863
Type :
conf
DOI :
10.1109/NSSMIC.2006.356030
Filename :
4179184
Link To Document :
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