DocumentCode :
465248
Title :
Megatrends and EDA 2017
Author :
Bacchini, Francine ; Spirakis, Greg ; Carballo, Juan-Antonio ; Keutzer, Kurt ; De Geus, Aart ; Hsu, Fu-Chieh ; Yamada, Kazu
Author_Institution :
Francine Bacchini, Inc., San Jose, CA
fYear :
2007
fDate :
4-8 June 2007
Firstpage :
21
Lastpage :
22
Abstract :
Today\´s megatrends include: Consumer cycles at 6-12 months (and getting faster) Process technology accelerating through 45nm (but with higher risks and lower yields) Fewer platform SOCs (each requiring more specialized hardware and software design tools) The search for 3-4 more `waves\´ for the semiconductor industry to ride to $IT by the end of the CMOS roadmap Design as a key enabler of Moore\´s Law and "more than Moore" value. What do these megatrends imply for the future of EDA? This panel will explore and debate such questions as the following, and give their views of EDA in the year 2017. Which business and technology trends will most affect the future of EDA, and why? What will be the key risk factors for electronics and semiconductor product companies, and how will EDA enable success? How will EDA, as well as the semiconductor industry, DAC, etc., look different in 2017 than it does today?
Keywords :
Argon; Business; Collaboration; Corporate acquisitions; Electronic design automation and methodology; Electronics industry; Embedded software; Gravity; Manufacturing automation; Permission;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Design Automation Conference, 2007. DAC '07. 44th ACM/IEEE
Conference_Location :
San Diego, CA
ISSN :
0738-100X
Print_ISBN :
978-1-59593-627-1
Type :
conf
Filename :
4261136
Link To Document :
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