DocumentCode
465261
Title
Width-dependent Statistical Leakage Modeling for Random Dopant Induced Threshold Voltage Shift
Author
Gu, Jie ; Sapatnekar, Sachin S. ; Kim, Chris
Author_Institution
Univ. of Minnesota, Minneapolis
fYear
2007
fDate
4-8 June 2007
Firstpage
87
Lastpage
92
Abstract
Statistical behavior of device leakage and threshold voltage shows a strong width dependency under microscopic random dopant fluctuation. Leakage estimation using the conventional square-root method shows a discrepancy as large as 45% compared to the real case because it fails to model the effective VT shift in the subthreshold region. This paper presents a width-dependent statistical leakage model with an estimation error less than 5%. Design examples on SRAMs and domino circuits demonstrate the significance of the proposed model.
Keywords
SRAM chips; estimation theory; leakage currents; statistical analysis; SRAM; device leakage; domino circuit; error estimation; leakage estimation; microscopic random dopant fluctuation; square-root method; statistical behavior; threshold voltage shift; width-dependent statistical leakage modeling; CMOS technology; Circuits; Fluctuations; Microscopy; Performance analysis; Resource description framework; Robustness; Semiconductor device modeling; Semiconductor process modeling; Threshold voltage; Design; Leakage; Performance; process variation; random dopant fluctuation;
fLanguage
English
Publisher
ieee
Conference_Titel
Design Automation Conference, 2007. DAC '07. 44th ACM/IEEE
Conference_Location
San Diego, CA
ISSN
0738-100X
Print_ISBN
978-1-59593-627-1
Type
conf
Filename
4261149
Link To Document