DocumentCode :
465308
Title :
Concurrent Wire Spreading, Widening, and Filling
Author :
Rizzo, Olivier ; Melzner, Hanno
Author_Institution :
Infineon Technol. France, Sophia Antipolis
fYear :
2007
fDate :
4-8 June 2007
Firstpage :
350
Lastpage :
353
Abstract :
Automated design tools produce layouts complying with all design rules (DRs). However, most wires are designed with minimum width, making them susceptible to random defect induced interruptions (opens). Spaces between wires are also often designed at minimum size, causing yield loss from random defect induced connections (shorts). SFF ("Spread - Fatten - Fill") is a methodology to improve layout - specifically for routing metal layers - in terms of yield loss related to opens and shorts. Additionally, a novel fill concept improves metal density uniformity. In this paper, we will explain issues that were observed and addressed in the implementation on a real layout, and present results achieved in the first experiment on silicon.
Keywords :
concurrent engineering; wires; automated design tools; concurrent wire spreading; metal density uniformity; random defect; random defect induced interruptions; routing metal layers; wire filling; wire widening; yield loss; Algorithm design and analysis; Filling; Integrated circuit synthesis; Manufacturing; Permission; Routing; Silicon; Space technology; Switches; Wire; Algorithms; Defect Limited Yield; Design; Experimentation; Filling; Manufacturing; Performance; Wire Spreading; Wire Widening;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Design Automation Conference, 2007. DAC '07. 44th ACM/IEEE
Conference_Location :
San Diego, CA
ISSN :
0738-100X
Print_ISBN :
978-1-59593-627-1
Type :
conf
Filename :
4261204
Link To Document :
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