Title : 
>23% High-Efficiency Tunnel Oxide Junction Bifacial Solar Cell With Electroplated Cu Gridlines
         
        
            Author : 
Heng, Jiunn Benjamin ; Jianming Fu ; Kong, Bob ; Yongkee Chae ; Wei Wang ; Zhigang Xie ; Reddy, Arun ; Lam, Kin-Man ; Beitel, Chris ; Liao, Chenglin ; Erben, Christoph ; Zhiquan Huang ; Zheng Xu
         
        
            Author_Institution : 
Silevo, Inc., Fremont, CA, USA
         
        
        
        
        
        
        
        
            Abstract : 
Based on the metal-insulator-semiconductor concept, Triex cell is a proprietary device structure that combines a tunnel oxide junction with doped a-Si thin-film emitter layers on n-type Czochralski silicon wafers. A simple patterning process is used along with cost-effective copper electrochemical plating to form the electrodes. This paper reports a >23% high-efficiency Triex solar cell, postoptimizing key process areas to improve passivation, junction quality, and shading effects. High open-circuit voltage (Voc) of 739 mV and good fill factor of 80.5% have been demonstrated on a 6-in solar cell. A champion 380-W Triex bifacial module is also validated under standard test conditions.
         
        
            Keywords : 
MIS structures; amorphous semiconductors; copper; crystal growth from melt; electrochemical electrodes; electroplating; semiconductor growth; semiconductor thin films; solar cells; Si-Cu; Triex cell; a-Si thin-film emitter layers; electrochemical plating; electroplated gridlines; fill factor; high-efficiency tunnel oxide junction bifacial solar cell; junction quality; metal-insulator-semiconductor concept; n-type Czochralski silicon wafers; open-circuit voltage; patterning process; shading effects; test conditions; Heterojunctions; Passivation; Photovoltaic cells; Photovoltaic systems; Silicon; Bifacial; heterojunction; high efficiency;
         
        
        
            Journal_Title : 
Photovoltaics, IEEE Journal of
         
        
        
        
        
            DOI : 
10.1109/JPHOTOV.2014.2360565