DocumentCode :
466623
Title :
Simulation of quasi-stationary and transient effects in gan based heterostructure field effect transistors
Author :
Braga, N. ; Mickevicius, R. ; Rao, V. ; Fichtner, W.
Author_Institution :
Synopsys Inc., Mountain View
fYear :
2006
fDate :
25-28 June 2006
Firstpage :
51
Lastpage :
56
Abstract :
Numerical simulations to compute stress distributions resulting from stressed overlayers reveal that significant stress fields can penetrate deep into device. Piezoelectric polarization effects from stressed overlayers are only mild due to relatively high stiffness in nitrides but can change band profile along the channel, especially under gate edges. Fringing fields in passivation layers with large dielectric constants can play important role in collapse reduction.
Keywords :
III-V semiconductors; gallium compounds; high electron mobility transistors; passivation; permittivity; piezoelectricity; wide band gap semiconductors; GaN based heterostructure field effect transistors; band profile; dielectric constants; fringing fields; passivation layers; piezoelectric polarization effects; quasistationary effects; stress distributions; transient effects; Computational modeling; Dielectric constant; Distributed computing; Gallium nitride; HEMTs; MODFETs; Numerical simulation; Passivation; Piezoelectric polarization; Stress;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
University/Government/Industry Microelectronics Symposium, 2006 16th Biennial
Conference_Location :
San Jose, CA
ISSN :
0749-6877
Print_ISBN :
1-4244-0267-0
Type :
conf
DOI :
10.1109/UGIM.2006.4286352
Filename :
4286352
Link To Document :
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