Nanoimprint Lithography for Optical Components

Nanoimprint lithography (NIL) is a new technique for lithographic patterning of nanostructures, which has advantages of high resolution, high throughput and low cost. This technique is presenting great opportunities for innovation and discovery in many engineering and scientific areas, such as electronic, optoelectronic and magnetism. We will show how the combination of different NIL techniques can lead to the realization of optical components such as waveguide gratings, sub-wavelength gratings, wavelength filters and photonic crystals, which in turn can lead to the design of optical devices with enhanced performance.