DocumentCode :
467615
Title :
A Statistical Model for Estimating the Effect of Process Variations on Delay and Slew Metrics for VLSI Interconnects
Author :
Ravindra, J.V.R. ; Srinivas, M.B.
Author_Institution :
Center for VLSI & Embedded Syst. Technol., Int. Inst. of Inf. Technol., Hyderabad, India
fYear :
2007
fDate :
29-31 Aug. 2007
Firstpage :
325
Lastpage :
330
Abstract :
For optimizations like placement, interconnect synthesis and static timing analysis, efficient interconnect delay computation is critical for RC networks. Because of its simple closed form and fast evaluation, the Elmore delay model has been widely used. The other delay metrics PRIMO and H-gamma match the first three circuit moments to the probability density function (PDF) of a Gamma statistical distribution. Although these methods demonstrate impressive accuracy compared to other delay metrics, their implementations tend to be challenging. In this paper simple and efficient two-parameter analytic expressions for both delay and slew, based on Erlang distribution (ERD) function, are presented under process variations. The effectiveness of the proposed metrics for RC trees is proved through experimental results.
Keywords :
VLSI; gamma distribution; integrated circuit interconnections; statistical distributions; Elmore delay model; Erlang distribution function; H-gamma; PRIMO; RC networks; VLSI interconnects; gamma statistical distribution; interconnect delay computation; interconnect synthesis; probability density function; static timing analysis; statistical model; Circuit synthesis; Computer networks; Delay effects; Delay estimation; Integrated circuit interconnections; Network synthesis; Probability density function; Statistical distributions; Timing; Very large scale integration;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Digital System Design Architectures, Methods and Tools, 2007. DSD 2007. 10th Euromicro Conference on
Conference_Location :
Lubeck
Print_ISBN :
978-0-7695-2978-3
Type :
conf
DOI :
10.1109/DSD.2007.4341488
Filename :
4341488
Link To Document :
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