DocumentCode :
468881
Title :
Process Technology - Advanced Process & Integration Technology
Author :
De Salvo, Barbara ; Lee, Tze-Liang
Author_Institution :
CEA/LETI
fYear :
2007
fDate :
10-12 Dec. 2007
Firstpage :
675
Lastpage :
675
Keywords :
CMOS technology; Dielectric devices; Electrodes; Epitaxial growth; Field programmable gate arrays; FinFETs; Paper technology; Substrates; Thin film devices; Tin;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices Meeting, 2007. IEDM 2007. IEEE International
Conference_Location :
Washington, DC
Print_ISBN :
978-1-4244-1507-6
Electronic_ISBN :
978-1-4244-1508-3
Type :
conf
DOI :
10.1109/IEDM.2007.4419035
Filename :
4419035
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=468881
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