DocumentCode :
47235
Title :
Separation of Interface Traps and Oxide Charge in Ionization Damaged Silicon Bipolar Transistors Based on Experimental Observation
Author :
Xingji Li ; Chaoming Liu ; Jianqun Yang
Author_Institution :
Sch. of Mater. Sci. & Eng., Harbin Inst. of Technol., Harbin, China
Volume :
15
Issue :
2
fYear :
2015
fDate :
Jun-15
Firstpage :
258
Lastpage :
260
Abstract :
An experimental concept of separating oxide-trapped charge and interface traps in silicon bipolar junction transistors (BJTs) irradiated by Co60 gamma ray is demonstrated. This concept is based on deep-level transient spectroscopy (DLTS) measurements with various filling pulsewidths. The characteristics of oxide-trapped charge and interface traps in bipolar transistors can be obtained by DLTS. The oxide-trapped charge shows positive and negative signals in the collector of NPN and PNP BJTs in DLTS signals, respectively. Unlike the oxide-trapped charge, the interface traps give positive signals in the same region of NPN and PNP BJTs.
Keywords :
bipolar transistors; elemental semiconductors; gamma-rays; interface states; radiation hardening (electronics); silicon; Co60 gamma ray; DLTS measurement; DLTS signal; NPN BJT collector; PNP BJT collector; Si; deep-level transient spectroscopy measurement; experimental observation; filling pulsewidth; interface traps; ionization damaged silicon bipolar transistors; oxide-trapped charge; silicon BJT; Bipolar transistors; Electron traps; Ionization; Junctions; Radiation effects; Silicon; Transistors; Bipolar junction transistors; DLTS; bipolar junction transistors; radiation damage; radiation defect;
fLanguage :
English
Journal_Title :
Device and Materials Reliability, IEEE Transactions on
Publisher :
ieee
ISSN :
1530-4388
Type :
jour
DOI :
10.1109/TDMR.2015.2423316
Filename :
7096984
Link To Document :
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