Title :
Reliable CVD Inter-Poly Dielectrics for Advanced E&EEPROM
Author :
Mori, S. ; Mikata, Y. ; Sato, M. ; Shinada, K. ; Yoshikawa, K. ; Nozawa, H. ; Matsuda, T. ; Yanase, T.
Author_Institution :
Semiconductor Device Engineering Labolatory Toshiba Corporation, Kawasaki, Japan
Keywords :
CMOS technology; Dielectric devices; EPROM; Leakage current; Oxidation; Stress control; Temperature; Thermal stresses; Transistors; Very large scale integration;
Conference_Titel :
VLSI Technology, 1985. Digest of Technical Papers. Symposium on
Conference_Location :
Kobe, Japan
Print_ISBN :
4-930813-09-3
