• DocumentCode
    472641
  • Title

    A Manufacturable Selective Tungsten Process for Applications in VLSI CMOS Devices

  • Author

    Metz, W.A. ; Szluk, N.J. ; Miller, G.W.

  • Author_Institution
    NCR Microelectronics 2001 Danfield Court Fort Collins, CO 80525
  • fYear
    1985
  • fDate
    14-16 May 1985
  • Firstpage
    48
  • Lastpage
    49
  • Keywords
    CMOS process; Contact resistance; Integrated circuit interconnections; Manufacturing processes; Metallization; Reproducibility of results; Silicon; Testing; Tungsten; Very large scale integration;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    VLSI Technology, 1985. Digest of Technical Papers. Symposium on
  • Conference_Location
    Kobe, Japan
  • Print_ISBN
    4-930813-09-3
  • Type

    conf

  • Filename
    4480297
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=472641