Title :
A Manufacturable Selective Tungsten Process for Applications in VLSI CMOS Devices
Author :
Metz, W.A. ; Szluk, N.J. ; Miller, G.W.
Author_Institution :
NCR Microelectronics 2001 Danfield Court Fort Collins, CO 80525
Keywords :
CMOS process; Contact resistance; Integrated circuit interconnections; Manufacturing processes; Metallization; Reproducibility of results; Silicon; Testing; Tungsten; Very large scale integration;
Conference_Titel :
VLSI Technology, 1985. Digest of Technical Papers. Symposium on
Conference_Location :
Kobe, Japan
Print_ISBN :
4-930813-09-3
