DocumentCode
472651
Title
A Three-Dimensional Process Simulator and its Application to Submicron VLSI´s
Author
Onga, S. ; Taniguchi, K.
Author_Institution
VLSI Research Center, TOSHIBA Corporation Kawasaki, 210 Japan
fYear
1985
fDate
14-16 May 1985
Firstpage
68
Lastpage
69
Keywords
Capacitors; Etching; Impurities; Ion implantation; Kinetic energy; Multidimensional systems; Oxidation; Predictive models; Process design; Very large scale integration;
fLanguage
English
Publisher
ieee
Conference_Titel
VLSI Technology, 1985. Digest of Technical Papers. Symposium on
Conference_Location
Kobe, Japan
Print_ISBN
4-930813-09-3
Type
conf
Filename
4480307
Link To Document