Title :
A Practical Optical Lithography for Three Quarters Micron Process
Author :
Hasegawa, Norio ; Kurosaki, Toshiei ; Matsuzawa, Toshiharu ; Hayashida, Tetsuya ; Sakai, Yoshio
Author_Institution :
Central Research Laboratory, Hitachi Ltd. Kokubunji, Tokyo 185, Japan
Keywords :
Electron beams; Electron optics; Energy resolution; Laboratories; Lithography; Pattern formation; Production; Resists; Throughput; Very large scale integration;
Conference_Titel :
VLSI Technology, 1985. Digest of Technical Papers. Symposium on
Conference_Location :
Kobe, Japan
Print_ISBN :
4-930813-09-3
