Title :
Radiation Damage Evaluation in an Excimer Laser Etching
Author :
Sekine, M. ; Okano, H. ; Yamabe, K. ; Hayasaka, N. ; Horiike, Y.
Author_Institution :
Toshiba VLSI Research Center, Toshiba Corp. 1, Toshiba-cho, Saiwai-ku, Kawasaki, Japan 210
Keywords :
Capacitance-voltage characteristics; Channel bank filters; Chemical lasers; Electrodes; Electron traps; Etching; Laser beams; Substrates; Very large scale integration; Voltage;
Conference_Titel :
VLSI Technology, 1985. Digest of Technical Papers. Symposium on
Conference_Location :
Kobe, Japan
Print_ISBN :
4-930813-09-3
