Title :
A High Throughput X-Ray Lithography with a Negative Resist for 0.3μm Devices
Author :
Suzuki, Y. ; Ishio, N. ; Eimori, T. ; Yoshioka, N. ; Yamazaki, T.
Author_Institution :
LSI Research and Development Laboratory, Mitsubishi Electric Corporation 4-1, Mizuhara, Itami, 664 Japan
Keywords :
Bridges; Dry etching; Fabrication; Large scale integration; Resists; Solvents; Stress; Throughput; Very large scale integration; X-ray lithography;
Conference_Titel :
VLSI Technology, 1986. Digest of Technical Papers. Symposium on
Conference_Location :
San Diego, CA, USA
