• DocumentCode
    472679
  • Title

    A High Throughput X-Ray Lithography with a Negative Resist for 0.3μm Devices

  • Author

    Suzuki, Y. ; Ishio, N. ; Eimori, T. ; Yoshioka, N. ; Yamazaki, T.

  • Author_Institution
    LSI Research and Development Laboratory, Mitsubishi Electric Corporation 4-1, Mizuhara, Itami, 664 Japan
  • fYear
    1986
  • fDate
    28-30 May 1986
  • Firstpage
    7
  • Lastpage
    8
  • Keywords
    Bridges; Dry etching; Fabrication; Large scale integration; Resists; Solvents; Stress; Throughput; Very large scale integration; X-ray lithography;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    VLSI Technology, 1986. Digest of Technical Papers. Symposium on
  • Conference_Location
    San Diego, CA, USA
  • Type

    conf

  • Filename
    4480343
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=472679