Title :
Patterning Accuracy and Overlay Performance in Step and Repeat X-Ray Lithography
Author :
Horiuchi, T. ; Deguchi, K. ; Saito, K. ; Komatsu, K. ; Miyake, M. ; Ozawa, A. ; Ohkubo, T.
Author_Institution :
NTT Electrical Communications Laboratories 3-1, Morinosato Wakamiya, Atsugi-shi, Kanagawa, 243-01 Japan
Keywords :
Controllability; Etching; Fabrication; Metallization; Position measurement; Resists; Substrates; Testing; Writing; X-ray lithography;
Conference_Titel :
VLSI Technology, 1986. Digest of Technical Papers. Symposium on
Conference_Location :
San Diego, CA, USA
