DocumentCode
472681
Title
A Mo Gate Submicron MOS Process Using Optical Projection Lithography
Author
Kwasnick, R.F. ; Griffing, B.F. ; Kaminsky, E.B. ; Frank, P.A. ; Kim, N.J.
Author_Institution
General Electric Company, Corporate Research and Development, Schenectady, NY 12301
fYear
1986
fDate
28-30 May 1986
Firstpage
11
Lastpage
12
Keywords
Annealing; Breakdown voltage; Lithography; MOS devices; Optical materials; Particle beam optics; Propagation delay; Research and development; Ring oscillators; Very large scale integration;
fLanguage
English
Publisher
ieee
Conference_Titel
VLSI Technology, 1986. Digest of Technical Papers. Symposium on
Conference_Location
San Diego, CA, USA
Type
conf
Filename
4480345
Link To Document