Title :
Channel Length and Source/Drain Series Resistance Extraction for Conventional and LDD MOSFET´s
Author :
Chang, Chi ; Hu, Genda ; Hui, Ken
Author_Institution :
Sierra Semiconductor Corporation 2075 North Capitol Avenue San Jose, California 95132
Keywords :
Data mining; Electric resistance; Electric variables measurement; Electrical resistance measurement; Implants; Length measurement; MOSFETs; Substrates; Testing; Voltage;
Conference_Titel :
VLSI Technology, 1986. Digest of Technical Papers. Symposium on
Conference_Location :
San Diego, CA, USA
