• DocumentCode
    472699
  • Title

    The Impact of Non-Ohmic Polysilicon Emitter Resistance on Bipolar Transistor Performance

  • Author

    Stork, J.M.C. ; Cressler, J.D.

  • Author_Institution
    IBM Research Center, P.O. Box 218, Yorktown Heights, NY 10598 (914) 945-2848
  • fYear
    1986
  • fDate
    28-30 May 1986
  • Firstpage
    47
  • Lastpage
    48
  • Abstract
    The potential performance enhancement of polysilicon emitters in bipolar transistors may be reduced when the contact resistance is high and nonohmic. Our experimental data shows the expected correlation between DC series resistance and AC switching performance even for polysilicon emitters without intentional interface oxides.
  • Keywords
    Bipolar transistors; Conductivity; Contact resistance; Current density; Current measurement; Degradation; Delay; Electrical resistance measurement; Performance gain; Temperature;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    VLSI Technology, 1986. Digest of Technical Papers. Symposium on
  • Conference_Location
    San Diego, CA, USA
  • Type

    conf

  • Filename
    4480363