DocumentCode
472722
Title
Advanced Excimer Laser Lithography
Author
Endo, M. ; Nakagawa, H. ; Hirai, Y. ; Sasago, M. ; Ogawa, K. ; Ishihara, T.
Author_Institution
Semiconductor Research Center Matsushita Electric Ind. Co., Ltd. Moriguchi-shi, Osaka, 570 Japan
fYear
1987
fDate
22-23 May 1987
Firstpage
5
Lastpage
6
Keywords
Circuits; Lithography; Photobleaching; Region 2; Resists; Semiconductor lasers; Shape; Solvents; Very large scale integration; Virtual manufacturing;
fLanguage
English
Publisher
ieee
Conference_Titel
VLSI Technology, 1987. Digest of Technical Papers. Symposium on
Conference_Location
Karuizawa, Japan
Type
conf
Filename
4480394
Link To Document